| 摘要 |
PURPOSE: A method and an apparatus for dry cleaning are provided to effectively remove surface contaminants by using a plasma shock wave and a short wavelength laser beam. CONSTITUTION: A laser beam generator(1) is generated a plasma shock wave(5) and irradiated the plasma shock wave(5) to a surface of a workpiece(6). A short wavelength laser beam generator(21) is generated a short wavelength laser beam(22) and irradiated the short wavelength laser beam(22) into the surface of the workpiece(6). By using the plasma shock wave(5) and the short wavelength laser beam(22), surface contaminants(7) formed on the workpiece(6) are effectively removed.
|
