发明名称 Method for forming a substructure of a multilayered laminate
摘要 A method for forming a substructure or an electrical structure. To form the substructure, a sheet of conductive material having exposed first and second surfaces is provided. A hole is formed through the sheet of conductive material. A first layer of dielectric material is applied to the exposed first surface, after the forming the hole. No material was inserted into the hole before applying the first layer of dielectric material to the exposed first surface. To form the electrical structure, a multilayered laminate that includes a plurality of substructures is formed such that a dielectric layer insulatively separates each pair of successive substructures.
申请公布号 US6832436(B2) 申请公布日期 2004.12.21
申请号 US20020094025 申请日期 2002.03.07
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ANSTROM DONALD O.;CHAMBERLIN BRUCE J.;FULLER, JR. JAMES W.;LAUFFER JOHN M.;MARKOVICH VOYA R.;POWELL DOUGLAS O.;RESAVY JOSEPH P.;STACK JAMES R.
分类号 H01L23/50;H01L23/538;H05K3/42;H05K3/46;(IPC1-7):H01K3/10;H01R12/04;H05K1/11 主分类号 H01L23/50
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