Process control based upon a metrology delay

摘要

A method and an apparatus for performing process control based upon a metrology delay. A process step is performed upon a first workpiece. Metrology data related to the first workpiece is acquired. A control adjustment based upon the metrology data is determined. A magnitude of the control adjustment is modified based upon a time period. The time period is defined by a first time frame relating to processing the first workpiece and a second time frame relating to acquiring metrology data related to the first workpiece.