| 摘要 |
PURPOSE:To improve stability with time, carrier wave to noise ratio (C/N) and pit shape by specifying the oxygen content in an under coat layer consisting of fluorocarbon to a specific ratio or below. CONSTITUTION:The content of the oxygen in the fluorocarbon film which is the under coat layer is confined to <5atom.%. After the inside of a vacuum vessel 1 is previously discharged from a discharge port 6 for the above- mentioned purpose, an inert as or a gas of a fluorocarbon monomer is introduced from an introducing port 4 into the vessel and an electric discharge is effected between electrodes 2 to form a sputtered film or plasma-polymerized film on a substrate 3. The oxygen content in the film can be confined to <5atom.% by such previous discharge in case of the sputtered film in this method and the film is formed under mild conditions as far as possible by lowering the discharge power in case of the plasma-polymerized film. The stability with time, the C/N and the bit shape are thereby improved. |
