发明名称 METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR MANUFACTURING STAMPER, AND METHOD FOR MANUFACTURING MOLDED PRODUCT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a molded product having a fine pattern, to provide a method for manufacturing a stamper suitable to manufacture a molded product having a fine pattern, and to provide a sputtering target suitable to manufacture the stamper. SOLUTION: The method includes the steps of: forming a resist pattern 2a on a quartz glass substrate 1 (A to C); depositing a resist layer 3 by RF sputtering by using a target prepared by hardening a photoresist (D); further depositing a base layer 4 by sputtering nickel (E); forming a metal layer 5 (F) thereon by plating with nickel; peeling the metal layer 6 and the base layer 4 from the quartz glass substrate 1 (G); removing the resist layer 3; and further rinsing the obtained part to complete the stamper 6 (H). COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004354952(A) 申请公布日期 2004.12.16
申请号 JP20030168372 申请日期 2003.06.12
申请人 SANYO ELECTRIC CO LTD 发明人 KOBAYASHI SHINJI
分类号 G03F7/40;C23C14/06;C23C14/34;G11B7/26;(IPC1-7):G03F7/40 主分类号 G03F7/40
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