发明名称 |
Adjustable lithography blocking device and method |
摘要 |
The present invention provides, in one embodiment, a method (100) of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate (110). A radiation path through the reticle and a window assembly located between a radiation source and resist (120), is considered. It is determined whether or not the radiation would expose a predefined blocking area of the resist within the exposure zone (130). If the radiation would expose a blocking area, then the window assembly is configured to prevent radiation from exposing the blocking area in the exposure zone (140). Other embodiments include a window assembly (300) and system (400) to facilitate manufacturing of the semiconductor device according to the method (100).
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申请公布号 |
US2004251429(A1) |
申请公布日期 |
2004.12.16 |
申请号 |
US20030459681 |
申请日期 |
2003.06.11 |
申请人 |
TEXAS INSTRUMENTS, INCORPORATED |
发明人 |
CHATTERJEE BASAB;GULDI RICHARD L.;MELCHER KEITH |
分类号 |
G03F7/20;(IPC1-7):G21K1/04 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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