SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can keep almost constant amount of vapor of the processing liquid supplied per unit period. SOLUTION: A hydrofluoric acid vapor generator 43 supplies the aqueous solution of hydrofluoric acid by discharging the same from a pressure dispersion nozzle 61 at the time of supplying the aqueous solution of hydrofluoric acid to an internal space 35 in a reservoir tank 57. Accordingly, since liquid pressure of the aqueous solution of hydrofluoric acid supplied to the internal space 35 of the reservoir tank 57 can be lowered and amount of the hydrofluoric acid vapor can be kept almost constant. Therefore, it can be prevented that the aqueous solution of supplied hydrofluoric acid splashes and the drops thereof are adhered to the internal wall of the ceiling 43a or the like at the internal side of the reservoir tank 57. Therefore, the film removing process can be performed almost equivalently to each substrate W. COPYRIGHT: (C)2005,JPO&NCIPI