DEVICE FOR GENERATION OF AND/OR INFLUENCING ELECTROMAGNETIC RADIATION FROM A PLASMA

摘要

The invention relates to a device for generation of and/or influencing electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements, in particular, for the generation and/or reflection of EUV-radiation for EUV-lithography. According to the invention, a magnetic means (10) for the generation of at least one inhomogeneous magnetic field (11) is provided as means for the targetted screening of at least one surface of the device (1; 5; 12) and/or another component (5; 12) from the charge carriers in the plasma (3). The service life of the device and/or other components is thus increased.