发明名称 RESIST REMOVER COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a composition of resist remover for removing so-called polymers such as a residual modified resist, an embedding material and an etching residue, while suppressing corrosion of metal lines such as copper or an insulating film such as a low-k film, in particular, for an electronic board having metal wires, and to provide a method of manufacturing an electronic board by using the composition of resist remover. SOLUTION: The resist remover composition contains a water-soluble amine and/or an ammonium compound, and an oxidizing agent, a radical scavenger and water. The method of manufacturing an electronic board is carried out by using the composition of the resist remover. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004354649(A) 申请公布日期 2004.12.16
申请号 JP20030151465 申请日期 2003.05.28
申请人 KAO CORP 发明人 YOSHIDA HIROYUKI
分类号 G03F7/42;H01L21/027;(IPC1-7):G03F7/42 主分类号 G03F7/42
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