| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for scanning exposure which are improved to realize effective prevention of an unsuitable exposure (fogging) on a sensitive substrate resulting from a pin hole defect besides a pattern area of an original plate without lowering a throughput or without generating a foreign matter. SOLUTION: In the device for scanning exposure, the profile of an illuminating beam IB illuminated to a reticle 2 is formed in a ring shape in a molding opening disposed near the reticle 2. The pattern area CP of the reticle 2 is exposed at both ends in an X direction while both the ends of the illumination beam IB in the X direction are moved by a pair of movable blind members 33A, 33B. Blind members are not provided at both the ends of the pattern region CP in a Y direction, but a defect-free area PF of one illumination beam IB is provided. Thus, unsuitable exposure (fogging) on the sensitive substrate due to the defect out of the pattern area CP can be prevented. COPYRIGHT: (C)2005,JPO&NCIPI
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