METHOD OF MANUFACTURING OPTICAL INTERFERENCE TYPE DISPLAY CELL

摘要

PROBLEM TO BE SOLVED: To provide a method of released etching of structure body for manufacturing an optical interference type display cell. SOLUTION: A first electrode and a sacrificial layer are successively formed on a transparent substrate, and an optical interference type display cell is positioned by forming at least two open parts on the first electrode and the sacrificial layer. A second electrode is formed on the sacrificial layer and a supporting body. Finally, the sacrificial layer is removed by a remote plasma etching method. COPYRIGHT: (C)2005,JPO&NCIPI