DEPOSITION APPARATUS USED FOR FABRICATING A SEMICONDUCTOR ELEMENT, CONCERNED WITH UNIFORMLY MAINTAINING PROCESS TEMPERATURE WITHIN A PROCESS CHAMBER AFTER A DEPOSITION PROCESS

摘要

PURPOSE: A deposition apparatus used for fabricating a semiconductor element is provided to maintain uniformly a process temperature within the process chamber though the reaction gas is deposited onto a shower head and an exhaust plate during the deposition process. CONSTITUTION: A susceptor(160) is installed at the inside of a process chamber(120). A semiconductor substrate is loaded on the susceptor. A heater(180) is used for maintaining a constant process temperature within a process chamber. A shower head(300) is used for spraying a reaction gas toward the semiconductor substrate. An anti-reflective layer(360) is coated on a surface of the shower head in order to minimize heat reflection from the surface of the shower head.