发明名称 MICRODEFECT INSPECTION APPARATUS AND METHOD FOR MANUFACTURING CIRCUIT BOARD
摘要 PROBLEM TO BE SOLVED: To provide a microdefect inspection apparatus for eliminating an enhancement of its optical performance and resolution and detecting microdefects on an inspected object at higher resolution (detecting the microdefects smaller than a focus diameter of an inspecting illumination light). SOLUTION: The microdefect inspection apparatus has a light source for vertically irradiating the inspected object with coherent microlight, a Fourier transform optical system for Fourier-transforming a reflection light from the inspected object, a light detection means for detecting a light quantity distribution of a Fourier-transformed optical pattern created on a Fourier transform plane by the Fourier-transformed reflection light and a defect detection means for detecting the microdefects on the inspected object from the light quantity distribution of the Fourier-transformed optical pattern. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004347434(A) 申请公布日期 2004.12.09
申请号 JP20030144042 申请日期 2003.05.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OUCHI KAZUO;KAITA KENICHI;OE SHUNICHIRO
分类号 G01B11/30;G01B11/24;G01N21/956;(IPC1-7):G01N21/956 主分类号 G01B11/30
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