发明名称 |
MICRODEFECT INSPECTION APPARATUS AND METHOD FOR MANUFACTURING CIRCUIT BOARD |
摘要 |
PROBLEM TO BE SOLVED: To provide a microdefect inspection apparatus for eliminating an enhancement of its optical performance and resolution and detecting microdefects on an inspected object at higher resolution (detecting the microdefects smaller than a focus diameter of an inspecting illumination light). SOLUTION: The microdefect inspection apparatus has a light source for vertically irradiating the inspected object with coherent microlight, a Fourier transform optical system for Fourier-transforming a reflection light from the inspected object, a light detection means for detecting a light quantity distribution of a Fourier-transformed optical pattern created on a Fourier transform plane by the Fourier-transformed reflection light and a defect detection means for detecting the microdefects on the inspected object from the light quantity distribution of the Fourier-transformed optical pattern. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004347434(A) |
申请公布日期 |
2004.12.09 |
申请号 |
JP20030144042 |
申请日期 |
2003.05.21 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
OUCHI KAZUO;KAITA KENICHI;OE SHUNICHIRO |
分类号 |
G01B11/30;G01B11/24;G01N21/956;(IPC1-7):G01N21/956 |
主分类号 |
G01B11/30 |
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