Exposure mask and pattern exposure method

摘要

An exposure mask which is capable of reducing non-uniformity in display by a liquid crystal display device. A mask pattern having pattern-forming portions and shield portions mosaically arranged therein is formed in one end portion of an exposure mask, and a mask pattern having pattern-forming portions and shield portions arranged in a manner complementary to the first-mentioned mask pattern is formed the other-end portion of the eposure mask. Further, the exposure mask is formed such that areas between vertically or laterally adjacent ones of the shield portions in mosaic areas where the pattern-forming portions and the shield portions are mosaically arranged are also shielded.