| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor adopting a structure of lifting up a substrate placed on a substrate board from the substrate board capable of stably processing the substrate by suppressing occurrence of abnormal discharge. SOLUTION: The substrate processor is provided with: a processing chamber the pressure of the interior of which is reduced; the substrate board deposited in the processing chamber and on which the substrate is placed; and pins accommodated in the inside of the board that are projected from the board resulting in that the tip parts of the pins are in contact with the substrate and lift up the substrate from the board, and a plasma being formed in the processing chamber to process the substrate. The board is formed with recessed parts at a face on which the substrate is placed, each of the recessed parts is formed with a hole in which the pin is contained, each of the tip parts is shaped greater than the diameter of the hole, contained in the inside of the recessed part while the pin is accommodated, and joined with the surface of the recessed part to cover the hole. COPYRIGHT: (C)2005,JPO&NCIPI |
