发明名称 METHOD FOR CLEANING/PROTECTING STRUCTURE AND CLEANING LIQUID AGENT/PROTECTING LIQUID AGENT KIT FOR STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for cleaning/protecting a structure and a cleaning liquid agent/protecting liquid agent kit for the structure which can highly clean the structure having composite stains accompanying stains by fungi or bacteria, to protect the structure by preventing generation of fungi or bacteria on the structure for a long term after cleaning, and to impart good color tones, strength, water repellency and the like to the structure as required. SOLUTION: The method for cleaning/protecting the structure comprises a cleaning step for cleaning the structure using at least one cleaning liquid agent selected from among four kinds of cleaning liquid agents including one containing sodium hypochlorite, sodium hydroxide, sodium carbonate, a nonionic surfactant and glycine and having a pH of 8-12, and a protecting step for protecting the structure using the protecting liquid agent selected from among four kinds of protecting liquid agents including one containing N-dimethyl-N'-phenol-N'-(fluorodichloromethylthio)-sulfamide, thiabentazole, a water-repelling agent and an organic solvent. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004346124(A) 申请公布日期 2004.12.09
申请号 JP20030142074 申请日期 2003.05.20
申请人 HOSOKAWA TAKESHI;ITO MASAHIRO;OSAWA HIROMICHI;ITO YOSHIAKI;TEMS:KK 发明人 HOSOKAWA TAKESHI;ITO MASAHIRO;OSAWA HIROMICHI;ITO YOSHIAKI
分类号 B08B3/08;A01N43/78;A01N47/04;A01N59/08;A01N59/10;C11D3/04;C11D3/10;C11D3/30;C11D3/37;C11D3/395;C11D3/43;C11D3/48;C11D7/10;(IPC1-7):C11D3/395 主分类号 B08B3/08
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