发明名称 Far-field measurement of properties of metallic thin films
摘要 Method and apparatus to optically measure properties of a metallic film using an excitation beam and a probe beam. The excitation beam creates a surface acoustic wave in the metallic film while the probe beam causes electron density waves (plasmons) in the metallic film. The detected intensity of the reflected probe beam indicates, e.g., a thickness of the metallic film.
申请公布号 US2004246485(A1) 申请公布日期 2004.12.09
申请号 US20030616482 申请日期 2003.07.08
申请人 IMANI BEHZAD;BRONGERSMA MARK LUITZEN 发明人 IMANI BEHZAD;BRONGERSMA MARK LUITZEN
分类号 G01N21/55;G01N21/63;G01N21/84;(IPC1-7):G01N21/55 主分类号 G01N21/55
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