发明名称 |
Far-field measurement of properties of metallic thin films |
摘要 |
Method and apparatus to optically measure properties of a metallic film using an excitation beam and a probe beam. The excitation beam creates a surface acoustic wave in the metallic film while the probe beam causes electron density waves (plasmons) in the metallic film. The detected intensity of the reflected probe beam indicates, e.g., a thickness of the metallic film.
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申请公布号 |
US2004246485(A1) |
申请公布日期 |
2004.12.09 |
申请号 |
US20030616482 |
申请日期 |
2003.07.08 |
申请人 |
IMANI BEHZAD;BRONGERSMA MARK LUITZEN |
发明人 |
IMANI BEHZAD;BRONGERSMA MARK LUITZEN |
分类号 |
G01N21/55;G01N21/63;G01N21/84;(IPC1-7):G01N21/55 |
主分类号 |
G01N21/55 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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