发明名称 Etching method and article etched molded by that method
摘要 A tuning-fork crystal wafer 1A which has legs 11, 12 with grooves 11c, 12c is shaped by etching of a crystal substrate 2. To improve processing precision of the depth of the grooves 11c, 12c, the width of the grooves 11c, 12c, is set in advance, based on the etch stop technique in which the amount of etching depends on the pattern of an etch portion. Consequently, as far as the etch time satisfies a required minimum time, it is possible to obtain the depth as designed.
申请公布号 US2004248423(A1) 申请公布日期 2004.12.09
申请号 US20040490367 申请日期 2004.03.23
申请人 SATO SHUNSUKE;KODA NAOKI;FUKUTOMI SHUNSUKE;SHIRAI TAKASHI 发明人 SATO SHUNSUKE;KODA NAOKI;FUKUTOMI SHUNSUKE;SHIRAI TAKASHI
分类号 H03H3/04;H03H9/21;(IPC1-7):H01L21/461;H01L21/302 主分类号 H03H3/04
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