发明名称 PRODUCTION METHOD OF TITANIUM OXIDE TARGET EXCELLENT IN STRENGTH AND RESISTANCE TO CRACK AT SPUTTERING
摘要 <P>PROBLEM TO BE SOLVED: To provide a production method of a titanium oxide target which is excellent in strength and resistance to cracks at sputtering and is used for forming a titanium oxide thin film. <P>SOLUTION: In the production method, the titanium oxide target excellent in crack resistance is produced by sintering or hot-pressing a titanium oxide raw powder in a non-oxidizing atmosphere. Here, a mixed powder is used as the titanium oxide raw powder. The mixed powder is obtained by compounding and mixing a titanium dioxide superfine powder having a specific surface area measured by the BET method (hereinafter referred to as the BET value) of 30-80 m<SP>2</SP>/g with a titanium dioxide powder having a BET value of 5-10 m<SP>2</SP>/g. The mixed powder comprises 0.1-15 mass% titanium dioxide superfine powder and the balance being titanium dioxide powder. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004346357(A) 申请公布日期 2004.12.09
申请号 JP20030143078 申请日期 2003.05.21
申请人 MITSUBISHI MATERIALS CORP 发明人 SHIRAI TAKANORI;MISHIMA TERUSHI
分类号 C04B35/46;C23C14/34 主分类号 C04B35/46
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