GAS SUPPLY STRUCTURE OF ION IMPLANTATION EQUIPMENT WITH IMPROVED ION GENERATION EFFICIENCY USING EXTENDED GAS INLET

摘要

PURPOSE: A gas supply structure of ion implantation equipment is provided to improve ion generation efficiency by elongating the length of a gas inlet between a source chamber and an arc chamber. CONSTITUTION: A gas supply structure of an ion implantation equipment supplies a gas from a gas container to an arc chamber(50) in a source chamber(40) through a gas inlet(30). At this time the gas inlet has an elongated length of 100-150cm connected to the arc chamber inside the source chamber so as to enlarge thermal contact area. The gas inlet has a spiral shape. Also, the gas inlet is made of a copper tube having high thermal conductivity.