STRUCTURE OF STRUCTURE RELEASE ADAPTED FOR INTERFERENCE DISPLAY CELL AND METHOD FOR MANUFACTURING THE SAME

摘要

PURPOSE: A structure of a structure release adapted for an interference display cell and a method for manufacturing the same are provided to reduce the manufacturing cost by removing an expensive Xenon difluoride etching process. CONSTITUTION: A structure of a structure release includes a first electrode, a second electrode, and a supporting body. The second electrode(404) includes at least one hole. The second electrode is arranged in parallel to the first electrode. The supporting body(412) is installed located between the first electrode and the second electrode. A cavity is formed among the supporter, the first electrode and the second electrode. When a structure release etching process is performed to remove a sacrificial layer(406) between the first electrode and the second electrode in order to form the cavity, an etchant passes through the hole to etch the sacrificial layer, in order to reduce the time needed in the structure release etching process.