BASIC COMPOUND HAVING BENZIMIDAZOLE STRUCTURE AND POLAR FUNCTIONAL GROUP, RESIST MATERIAL CONTAINING THE BASIC COMPOUND USEFUL FOR MICROMACHINING AND PATTERN FORMATION METHOD USING THE MATERIAL

摘要

PURPOSE: Provided are a basic compound, a resist material containing the basic compound which is excellent in resolution and focus margin and is useful for the micromachining using an electron ray or a deep UV ray, and a formation method of a pattern using the material. CONSTITUTION: The basic compound is represented by the formula 1, wherein R1 is H, a C1-C10 linear, branched or cyclic alkyl group, a C6-C10 aryl group or a C7-C10 aralkyl group; and R2 is a C1-C20 linear, branched or cyclic alkyl group having a polar functional group and the polar functional group comprises at least one of an ester group, an acetal group and a cyano group and may comprise at least one of a hydroxyl group, a carbonyl group, an ether group, a sulfide group and a carbonate group. The resist material contains at least one kind of the basic compound having a benzimidazole structure and a polar functional group represented by the formula 1.