发明名称 |
Negative resist material and method for forming resist pattern |
摘要 |
Disclosed is a negative-working resist material comprising a polymeric compound having a polymerizable unit comprising at least a hydroxy acid moiety and a main chain moiety bound to each other via only one carbon in the carbon skeleton of the hydroxy acid, wherein a space of such size as to permit an alkali substance to approach a linkage between the hydroxy acid moiety and the main chain moiety is not present between the two moieties. The material can be used as a negative-working resist material containing the polymeric compound and an acid generating agent, which is easily synthesized and excellent in shelf stability and processing stability upon alkali treatment.
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申请公布号 |
US2004241576(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
US20040808425 |
申请日期 |
2004.03.25 |
申请人 |
IWASHITA JYUN;TACHIKAWA TOSHIKAZU |
发明人 |
IWASHITA JYUN;TACHIKAWA TOSHIKAZU |
分类号 |
C08F220/02;C08F220/28;G03C1/76;G03F7/033;G03F7/038;H01L21/027;(IPC1-7):G03C1/76 |
主分类号 |
C08F220/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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