发明名称 Negative resist material and method for forming resist pattern
摘要 Disclosed is a negative-working resist material comprising a polymeric compound having a polymerizable unit comprising at least a hydroxy acid moiety and a main chain moiety bound to each other via only one carbon in the carbon skeleton of the hydroxy acid, wherein a space of such size as to permit an alkali substance to approach a linkage between the hydroxy acid moiety and the main chain moiety is not present between the two moieties. The material can be used as a negative-working resist material containing the polymeric compound and an acid generating agent, which is easily synthesized and excellent in shelf stability and processing stability upon alkali treatment.
申请公布号 US2004241576(A1) 申请公布日期 2004.12.02
申请号 US20040808425 申请日期 2004.03.25
申请人 IWASHITA JYUN;TACHIKAWA TOSHIKAZU 发明人 IWASHITA JYUN;TACHIKAWA TOSHIKAZU
分类号 C08F220/02;C08F220/28;G03C1/76;G03F7/033;G03F7/038;H01L21/027;(IPC1-7):G03C1/76 主分类号 C08F220/02
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