| 发明名称 |
Forming a semiconductor device feature using acquired parameters |
| 摘要 |
In one embodiment of the present invention, a method includes acquiring parameters for a desired feature of a semiconductor device; determining a data array using the parameters; and forming the desired feature using the data array. The desired feature in one embodiment may be a backside trench.
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| 申请公布号 |
US2004241891(A1) |
申请公布日期 |
2004.12.02 |
| 申请号 |
US20040848894 |
申请日期 |
2004.05.19 |
| 申请人 |
SCOTT DANE L.;VASQUEZ KEVIN J. |
发明人 |
SCOTT DANE L.;VASQUEZ KEVIN J. |
| 分类号 |
H01L21/00;(IPC1-7):H01L21/66 |
主分类号 |
H01L21/00 |
| 代理机构 |
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