发明名称 METHOD FOR SINTERING SEMICONDUCTOR PARTICULATE DISPERSION SOLUTION ON POLYMER FILM SURFACE, AND PHOTOCELL
摘要 <P>PROBLEM TO BE SOLVED: To provide a sintering method of a semiconductor particulate dispersion solution suitable for a photoelectrode. <P>SOLUTION: This application relates to this sintering method characterized by that the semiconductor particulate dispersion solution is applied to a polymer film surface, and then sintered by microwaves of 28 Ghz, and also relates to this photocell characterized by having: a transparent electrode layer formed by stacking a transparent conductive layer on one surface of a transparent substrate of a polymer film; a semiconductor film layer sintered on a surface of the transparent electrode layer by microwaves of 28 GHz; an electrode layer; and an electrode couple. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004342319(A) 申请公布日期 2004.12.02
申请号 JP20030081766 申请日期 2003.03.25
申请人 KANSAI PAINT CO LTD 发明人 KAWARAIE MASAHIDE;UCHIDA SATOSHI;FUHA MIHO
分类号 H01L31/04;H01M14/00 主分类号 H01L31/04
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