发明名称 |
Tool, especially a cutting tool, comprising a substrate member onto which at least one layer is deposited by means of chemical vapor deposition (CVD) used in machining operations, e.g. metal cutting |
摘要 |
<p>Tool, especially a cutting tool comprises a substrate member onto which at least one layer is deposited by means of chemical vapor deposition (CVD), and a method for CVD of a two-phase layer on a sintered part. The individual deposited layers or at least one of them contain TiCN-, TiOCN-, TiOC-, or TiC phases and an additional ZrO 2 and/or HfO 2 phase. An independent claim is included for CVD of a two-phase layer in a gas atmosphere containing TiCl 4, HfCl 4 and/or ZrCl 4 and CO 2, acetonitrile, pyridine, or benzene, remainder hydrogen and/or argon.</p> |
申请公布号 |
DE10320652(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
DE2003120652 |
申请日期 |
2003.05.07 |
申请人 |
KENNAMETAL WIDIA GMBH & CO.KG |
发明人 |
SOTTKE, VOLKMAR;WESTPHAL, HARTMUT;BERG, HENDRIKUS VAN DEN |
分类号 |
C23C16/30;C23C30/00;(IPC1-7):C23C30/00;C23C16/22 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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