发明名称 |
Liquid crystal device, active matrix substrate, display device, and electronic equipment |
摘要 |
To provide a liquid crystal device capable of controlling leakage current of a thin-film transistor to an extremely low level, making it easy to achieve extra-high definition of pixels, and to provide electronic equipment having the liquid crystal device, a liquid crystal device includes a TFT of a P-type transistor having a semiconductor layer formed of polysilicon, and a plurality of gate electrodes that intersect with the semiconductor layer at a plurality of locations. The liquid crystal device has an LDD structure in which lightly doped regions are formed on both sides of each channel region of the semiconductor layer. A light shielding device (a light shielding film and a data line branched portion) are provided on both sides in the direction of the thickness of the thin-film transistor.
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申请公布号 |
US2004239825(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
US20040825301 |
申请日期 |
2004.04.16 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KOIDE SHIN;ITO TOMOYUKI;KOSHIHARA TAKESHI;KITAGAWA ATSUSHI |
分类号 |
G02F1/1335;G02F1/136;G02F1/1362;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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