| 摘要 |
PURPOSE: A device for etching glass is provided to etch a glass without breaking an inner circuit of a glass in the etching process by having a water pocket in the vicinity of the etching bath and minimizing an evaporation of hydrogen fluoride(HF) solution. CONSTITUTION: A device for etching glass includes hydrogen fluoride(HF) etching math(1), quick dump rinse(QDR) bath(2) and a dry bath(3). An HF reproduction tank(5) and HF providing tank(4) are mounted to a lower part of HF etching bath(1). Two HF original liquid providers(10,11) are mounted to the HF providing tank(4). A bubble plate and a punching plate are mounted to a lower part of HF etching bath(1), so that a glass surface is evenly etched by a nitrogen gas bubble. Glasses of 20 or 25 for TFT-LCD are inserted into a cassette, and are sequentially moved as one cassette unit by using a robot. The HF solution in the providers(10,11) has a density of about 50%, and is mixed with a pure water. If the glass etching process is completed in the HF etching bath(1), the robot elevates the cassette, and moves the cassette in QDR bath(2). The glass cassette moved to the QDR bath(2) disperses a pure water through a shower device, and cleans the HF solution and an impurity. If the glass cleaning process is completed in QDR bath(2), the robot elevates the cassette, and moves the cassette to the dry bath(3). A nitrogen gas is dispersed in a dry bath, so that a glass surface is completely dried. If the process is completed, in the dry bath, all workings are terminated.
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