| 发明名称 |
PLASMA APPARATUS, GAS DISTRIBUTION ASSEMBLY FOR A PLASMA APPARATUS AND PROCESSES THEREWITH |
| 摘要 |
A plasma apparatus, various components of the plasma apparatus, and an oxygen free and nitrogen free processes for effectively removing photoresist material and post etch residues from a substrate with a carbon and/or hydrogen containing low k dielectric layer(s).
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| 申请公布号 |
US2004238123(A1) |
申请公布日期 |
2004.12.02 |
| 申请号 |
US20030249962 |
申请日期 |
2003.05.22 |
| 申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
BECKNELL ALAN FREDERICK;BUCKLEY THOMAS JAMES;FERRIS DAVID;PINGREE RICHARD E.;SAKTHIVEL PALANIKUMARAN;SRIVASTAVA ASEEM KUMAR;WALDFRIED CARLO |
| 分类号 |
H01J37/32;(IPC1-7):C23F1/00 |
主分类号 |
H01J37/32 |
| 代理机构 |
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