发明名称 Back pressure control system for CMP and wafer polishing
摘要 A wafer carrier with a back pressure applicator system adapted to provide high resolution back pressure control. A plurality of millimeter scale distensible elements are disposed between the wafer carrier pressure plate and a process wafer, and selectively distended to provide excess backpressure to select small areas of a wafer known to exhibit resistance to removal vis-a-vis the surrounding wafer surface. Distensible elements may be in the form of expandable pneumatic chambers or electro-mechanical elements such as solenoids, shape memory elements, electrostatic plates, etc.
申请公布号 US2004242135(A1) 申请公布日期 2004.12.02
申请号 US20030452411 申请日期 2003.05.30
申请人 STRASBAUGH 发明人 STRASBAUGH ALAN
分类号 B24B37/04;B24B49/16;(IPC1-7):B24B7/22 主分类号 B24B37/04
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