发明名称 METHOD FOR MANUFACTURING LIQUID PHOTOSENSITIVE RESIN RELIEF PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plate making method for obtaining a relief printing plate which achieves a quality level comparable to that of a plate obtained by an aqueous surfactant solution developing system with a large development latitude, without leaving a mark of cutting in a plate surface or scooping out a hole in the skirt of a relief, in a method for manufacturing a liquid photosensitive resin printing plate using a high pressure water developing system. <P>SOLUTION: In the plate making method, a liquid photosensitive resin composition having a specified resin viscosity, a specified hardness of a body cured by a photoreaction and a specified photocuring property is used when a high pressure water developing system with a water pressure of 1-20 MPa is used. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004341286(A) 申请公布日期 2004.12.02
申请号 JP20030138375 申请日期 2003.05.16
申请人 ASAHI KASEI CHEMICALS CORP 发明人 YOSHIDA MASAHIRO;MATSUSHITA NORIMITSU
分类号 G03F7/004;C08F290/06;G03F7/00;G03F7/027;G03F7/028;G03F7/26;G03F7/30;G03F7/32;G03F7/40 主分类号 G03F7/004
代理机构 代理人
主权项
地址