发明名称 |
METHOD FOR MANUFACTURING LIQUID PHOTOSENSITIVE RESIN RELIEF PRINTING PLATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plate making method for obtaining a relief printing plate which achieves a quality level comparable to that of a plate obtained by an aqueous surfactant solution developing system with a large development latitude, without leaving a mark of cutting in a plate surface or scooping out a hole in the skirt of a relief, in a method for manufacturing a liquid photosensitive resin printing plate using a high pressure water developing system. <P>SOLUTION: In the plate making method, a liquid photosensitive resin composition having a specified resin viscosity, a specified hardness of a body cured by a photoreaction and a specified photocuring property is used when a high pressure water developing system with a water pressure of 1-20 MPa is used. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2004341286(A) |
申请公布日期 |
2004.12.02 |
申请号 |
JP20030138375 |
申请日期 |
2003.05.16 |
申请人 |
ASAHI KASEI CHEMICALS CORP |
发明人 |
YOSHIDA MASAHIRO;MATSUSHITA NORIMITSU |
分类号 |
G03F7/004;C08F290/06;G03F7/00;G03F7/027;G03F7/028;G03F7/26;G03F7/30;G03F7/32;G03F7/40 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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