| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for calibrating a lithographic device, an aligning method, a computer program, a lithographic device and a method for manufacturing a device, which are improved methods of calculating a distortion in a substrate image. SOLUTION: The method for compensating the distortion of an optical system for a front-to-backside alignment is provided, in which a displacement vector between the predicted position of a substrate mark and the actual position of the substrate mark is calculated. An optical correction array is calculated, by moving a reference substrate by a fixed amount, and comparing which point image of the rear surface of the reference substrate and the corresponding point of the front surface of the substrate has moved, and by how much it has moved away. Next, the position of other substrate is calculated accurately by using the displacement vector and the optical correction array.The optical system for the front-to-backside alignment is enlarged fully to project simultaneously two or more marks through each branch. The reference mark are inscribed in the object window of the optical system for the front-to-backside alignment, and the variations of the optical characteristics of the optical system for the front-to backside alignment are indicated by the relative position variations between the image of the reference mark projected through a single branch of the optical system for the front-to-backside alignment, and the image of the substrate mark. COPYRIGHT: (C)2005,JPO&NCIPI |
