| 摘要 |
PROBLEM TO BE SOLVED: To provide lithography equipment which makes temperature stability of a projection system surer by active heat transport, while minimizing impact of mechanical vibration by the heat transport. SOLUTION: In the lithography projection equipment, the projection system comprises one or more optical operating mirrors, and a heat shield which shields heat emission to the mirrors and/or a supporting structure of the mirrors or from the mirrors and/or the supporting structure of the mirrors. Although the heat shield is cooled compulsorily, as the mirrors and the heat shield are supported separately by a supporting frame, vibration of the mirrors by forced cooling is reduced. Preferably, the heat shield includes a heat shield which shields heat emission to the mirrors or from the mirrors, and shields heat emission to heat shields and/or supporting structures for individual mirrors or from the heat shields and/or the supporting structures. COPYRIGHT: (C)2005,JPO&NCIPI |
