发明名称 [SUBSTRATE AND PROCESS FOR FABRICATING THE SAME]
摘要 A substrate comprises at least a semi-finished substrate, a circuit line, a contact and a solder mask layer. The circuit line and the contact are formed on the semi-finished substrate. The circuit line and the contact are connected together non-integrally. The solder mask layer is formed over the semi-finished substrate to cover the circuit line. The solder mask layer has an opening in which the contact is formed.
申请公布号 US2004238214(A1) 申请公布日期 2004.12.02
申请号 US20030707015 申请日期 2003.11.14
申请人 LIU PO-CHIH 发明人 LIU PO-CHIH
分类号 H01L21/48;H05K3/10;H05K3/24;H05K3/28;H05K3/42;H05K3/46;(IPC1-7):H05K1/11 主分类号 H01L21/48
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