APPARATUS WITH PREDETERMINED LAYER COATED ON OUTER WALL OF REACTION FURNACE FOR FORMING THIN FILM

摘要

PURPOSE: An apparatus for forming a thin film is provided to improve the uniformity of the thin film and to enhance the yield by coating a predetermined layer on an outer wall of a reaction furnace. CONSTITUTION: An apparatus includes a reaction furnace(31), a wafer support pedestal, a heating furnace, and a predetermined layer. The wafer support pedestal is installed in the reaction furnace to support at least one wafer. The heating furnace(33) is installed outside the reaction furnace. The predetermined layer(50) is coated on an outer wall of the reaction furnace. The thickness of the predetermined layer is 2 μm. The predetermined layer is made of SiC.