| 发明名称 |
Etching apparatus and etching method |
| 摘要 |
An etching apparatus includes a shield device provided on an electrode in a reaction chamber and surrounding an object to be etched. The shield device has a surface area according to an opening area ratio of the object to be etched.
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| 申请公布号 |
US2004241995(A1) |
申请公布日期 |
2004.12.02 |
| 申请号 |
US20040807191 |
申请日期 |
2004.03.24 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
YAMANAKA MICHINARI |
| 分类号 |
H01J37/32;H01L21/311;H01L21/768;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H01J37/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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