发明名称 |
Substrate monitoring method and apparatus |
摘要 |
A substrate processing apparatus comprises a chamber 28 capable of processing a substrate 20. A radiation source 58 provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector 62 is provided to detect the reflected radiation and generate a signal. A controller 100 is adapted to receive the signal and determine a property of the substrate 20 in situ during processing, before an onset of during or after processing of a material on the substrate 20.
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申请公布号 |
US6824813(B1) |
申请公布日期 |
2004.11.30 |
申请号 |
US20000545110 |
申请日期 |
2000.04.06 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
LILL THORSTEN B.;GRIMBERGEN MICHAEL N.;TREVOR JITSKE;JIANG WEI-NAN;CHINN JEFFREY |
分类号 |
C23C16/40;G01B11/06;(IPC1-7):H05H1/00;B05C11/00;C23C14/54 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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