发明名称 IMAGE EXPOSURE APPARATUS AND IMAGE EXPOSURE METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an image exposure apparatus and an image exposure method for stably improving the picture quality even when the light quantity of a light beam used for image recording does not reach the exposure light quantity in a rising or falling period. <P>SOLUTION: In an image exposure apparatus 10, a light beam emitted from a light source is made to scan and expose a photosensitive material along an image based on an image signal D. The image exposure apparatus 10 is equipped with a light quantity measuring part to measure the light quantity of the beam; an exposure light quantity setting part to set the exposure light quantity of the beam with respect to the photosensitive material; an edge detecting part to detect the rising period and falling period of the beam responding to the image signal; and an edge light quantity setting part to set the light quantity in the rising period or falling period of the light beam for the determined exposure light quantity. When the light quantity in at least the rising period or falling period of the beam is less than the exposure light quantity, the light quantity in at least the rising period or falling period of the beam is controlled by the edge light quantity setting part. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004333804(A) 申请公布日期 2004.11.25
申请号 JP20030128802 申请日期 2003.05.07
申请人 FUJI PHOTO FILM CO LTD 发明人 YOKOTA KENJI
分类号 B41J2/44;B41J2/45;B41J2/455;G03F7/20;G03F7/24;H04N1/036;(IPC1-7):G03F7/20 主分类号 B41J2/44
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