发明名称 COATER, METHOD FOR FORMING THIN FILM, SYSTEM FOR FORMING THIN FILM, PROCESS FOR FABRICATING SEMICONDUCTOR DEVICE, AND ELECTRO-OPTICAL DEVICE, ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a coater, a thin film forming method and a thin film forming system in which a high performance thin film can be obtained with high reproducibility while reducing defects, maintenance can be carried out efficiently in safety and a thin film can be formed at a low cost, and to provide a process for fabricating a semiconductor device, an electro-optical device and an electronic apparatus. SOLUTION: The coater for coating a substrate W with liquid material in a coating chamber 40 comprises a first liquid supply system 50 for supplying liquid material to the coating chamber 40. The first liquid supply system 50 is provided with second liquid supply systems 52 and 92 for supplying liquid in order to clean or deactivate a liquid material remaining in the coating chamber 40 or the first liquid supply system 50. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004335571(A) 申请公布日期 2004.11.25
申请号 JP20030126317 申请日期 2003.05.01
申请人 SEIKO EPSON CORP 发明人 YUDASAKA KAZUO
分类号 G02F1/13;B05C5/02;B05C9/10;B05C9/12;B05C9/14;B05C11/00;B05C11/08;B05C11/10;G02F1/1362;H01L21/00;H01L21/027;H01L21/208;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L29/786;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):H01L21/208;G02F1/136;H01L21/320 主分类号 G02F1/13
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