| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to radiation, excellent in sensitivity, resolution, dry etching resistance, pattern profile, etc., and useful as a chemically amplified resist. <P>SOLUTION: The radiation-sensitive resin composition contains (A) an alkali-insoluble or slightly alkali-soluble resin which has at least two repeating units selected from the group of the repeating units represented by formulae (1)-(6) in an amount of 1-49 mol% each and in a total amount of 5-50 mol% and is made readily alkali-soluble by the action of an acid and (B) a radiation-sensitive acid generator. In formulae (1)-(6), R<SP>1</SP>denotes H or methyl; R<SP>2</SP>denotes alkyl which may have a 1-4C substituent. and when a plurality of symbols R<SP>2</SP>are present, they may be the same or different. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
