发明名称 Plating apparatus, plating method, and method for manufacturing semiconductor device
摘要 Problem: It has been desired to form a plurality of combinations of plating films continuously on a single transfer rail and to form a plating film having a high quality and a uniform thickness on the surfaces of a lead frame and leads. Solving Means: The plating apparatus is provided below the single transfer rail with a plurality of plating tanks, in which plating solution baths are disposed. By moving the plating solution between the plating tanks and the plating solution baths, it is possible to select a plating film to be formed on a conductive member (21). As a result, it is possible to form combinations of plating films on the conductive member (21) continuously by the single transfer rail.
申请公布号 US2004235219(A1) 申请公布日期 2004.11.25
申请号 US20040487158 申请日期 2004.02.18
申请人 OKADA KEI 发明人 OKADA KEI
分类号 C25D5/10;C25D17/28;H01L21/56;H01L23/31;H01L23/495;H05K3/28;(IPC1-7):H01L21/44 主分类号 C25D5/10
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