发明名称 MICRO-ACTUATOR ELEMENT AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a micro-actuator element by which the micro-actuator element which can be driven with a low voltage and which can be operated at high speed can be manufactured by simple processes with a good yield, and to provide the micro-actuator element. SOLUTION: The micro-actuator element of this invention comprises a substrate having a recessed part provided at least on one side by etching, a fixed electrode formed along the recessed face of the recessed part, and a movable film facing the fixed electrode, and is characterized in that the movable film is driven so as to be attracted to the fixed electrode or separated from the fixed electrode by the electrostatic force generated between the fixed electrode and the movable film. The movable film is made principally of silicon. The movable film is 0.1 to 100μm thick. The radius of curvature near the center part of the recessed part is 0.008 to 600 mm. The plan view diameter of the recessed part is 8 to 3,000μm. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004333654(A) 申请公布日期 2004.11.25
申请号 JP20030126690 申请日期 2003.05.01
申请人 SEIKO EPSON CORP 发明人 SHIMIZU NOBUO
分类号 G02B26/08;(IPC1-7):G02B26/08 主分类号 G02B26/08
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