| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition suitable for use under an exposure light source of ≤200 nm, particularly F<SB>2</SB>excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory transmittance when a light source of 157 nm is used and are improved in solvent solubility, occurrence of striation, coating uniformity and line edge roughness. <P>SOLUTION: The positive resist composition contains a resin containing a specified repeating unit having a cyano group in a backbone and having solubility in an alkali developing solution increased by the action of an acid and a compound which generates an acid upon irradiation with an actinic ray or radiation. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
