| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition for forming an optical waveguide which is superior in a pattering refractive index, heat resistance, transmission characteristic, etc. SOLUTION: The photosensitive resin composition for optical waveguide formation contains (A) di(meth)acrylate shown by a general formula (1), (B) mono(meth)acrylate represented as a general formula (2), and (C) an photo-radical polymerization initiator. The general formula (1) is shown in the figure. Here: R<SP>1</SP>is -(OCH<SB>2</SB>CH<SB>2</SB>)<SB>m</SB>-, -(OCH(CH<SB>3</SB>)CH<SB>2</SB>)<SB>m</SB>- or -OCH<SB>2</SB>CH(OH)CH<SB>2</SB>-; X is -C(CH<SB>3</SB>)<SB>2</SB>-, -CH<SB>2</SB>-, -O-, or -SO<SB>2</SB>-; Y is a hydrogen atom or halogen atom; and m is an integer of 0 to 4. The general formula (2) is shown in the figure. Here: R<SB>1</SB>is -(OCH<SB>2</SB>CH<SB>2</SB>)<SB>p</SB>-, -(OCH(CH<SB>3</SB>)CH<SB>2</SB>)p-, or -OCH<SB>2</SB>CH(OH)CH<SB>2</SB>-; Y is a hydrogen atom, a halogen atom, Ph-C(CH<SB>3</SB>)<SB>2</SB>-, Ph-, or a C1 to 20 alkyl group; p is an integer of 0 to 4; and Ph is a phenyl group. COPYRIGHT: (C)2005,JPO&NCIPI |
