Composition for film formation and film

摘要

A composition for film formation and a film obtained by heating the composition. The composition comprises: (A) a hydrolyzate and/or partial condensate of a compound represented by the following formula (1) R<1>nSi(OR<2>)4-n wherein R<1> and R<2> may be the same or different and each represent an alkyl group having 1 to 5 carbon atoms or an aryl group having 6 to 20 carbon atoms, and n is an integer of 1 or 2; (B) a metal chelate compound represented by the following formula (2) R<3>tM(OR<4>)s-t wherein R<3> represents a cheating agent, M represents a metal atom, R<4> represents an alkyl group having 2 to 5 carbon atoms or an aryl group having 6 to 20 carbon atoms, s represents a valence of the metal M, and t is an integer of 1 to s; (C) an organic solvent having a boiling point of 110 to 180 DEG C; and (D) beta -diketone.