EPITAXIALLY COATED SILICON WAFER,申请号KR20070139771-传众专利搜索

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发明名称	EPITAXIALLY COATED SILICON WAFER
摘要
申请公布号	KR100828622(B1)	申请公布日期	2008.05.09
申请号	KR20070139771	申请日期	2007.12.28
申请人		发明人
分类号	H01L21/20	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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