Determination of permeability of layer material within interconnect

摘要

Electromigration permeability is determined for a layer material within an interconnect test structure comprised of a feeder line, a test line, and a supply line. A no-flux structure is disposed between the feeder line and the test line, and the layer material is disposed between the test line and the supply line. A respective current density and length product for each of the test line and the supply line is less than a critical Blech length constant, (J*L)CRIT. A net current density and length product (J*L)NET for the test line and the supply line is greater than the (J*L)CRIT. The electromigration permeability of the layer material is determined from an electromigration lifetime of the interconnect test structure with current flowing therein.