发明名称 |
Method and device for measuring contamination of a surface of a component of a lithographic apparatus |
摘要 |
A measuring device for determining contamination of a surface of a component in an lithographic projection apparatus. The measuring device includes a radiation transmitter for transmitting radiation on at least a part of the surface and a radiation receiver for receiving radiation from the component. A processor is communicatively connected to the receiver, for deriving a property of received radiation and deriving a property of the contamination from the property of received radiation.
|
申请公布号 |
US2004227102(A1) |
申请公布日期 |
2004.11.18 |
申请号 |
US20040783087 |
申请日期 |
2004.02.23 |
申请人 |
ASML NETHERLANDS B.V.;CARL ZEISS SMT AG |
发明人 |
KURT RALPH;VAN BEEK MICHAEL CORNELIS;DUISTERWINKEL ANTONIE ELLERT;KIEFT ERIK RENE;MEILING HANS;MERTENS BASTIAAN MATTHIAS;MOORS JOHANNES HUBERTUS JOSEPHINA;STEVENS LUCAS HENRICUS JOHANNES;WOLSCHRIJN BASTIAAN THEODOOR |
分类号 |
G01N21/94;G01N21/27;G01N21/33;G01N21/35;G01N21/956;G03F7/20;G21K5/00;G21K5/02;H01L21/027;(IPC1-7):G01N21/00 |
主分类号 |
G01N21/94 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|