发明名称 ATMOSPHERIC PRESSURE PLASMA TREATMENT METHOD, AND SYSTEM USED THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma treatment method with a simple constitution where the deposition of a uniform film is possible correspondingly to the various widths of base materials without causing the problems as for the change in the curling of a base material, deterioration in the shape of rolling and its fracture in the process of conveyance, and to provide a system used therefor. <P>SOLUTION: In the atmospheric plasma treatment system, discharge plasma is generated by applying high frequency voltage to the space between confronted electrodes under the atmospheric pressure or under the pressure in the vicinity of the atmospheric pressure, and a thin film is deposited on the surface of an arranged base material, and a means of changing the area of the opening confronted with the base material in a gas feeding part feeding a discharge gas to a discharge plasma generating part is provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004323928(A) 申请公布日期 2004.11.18
申请号 JP20030121502 申请日期 2003.04.25
申请人 KONICA MINOLTA OPTO INC 发明人 MORINAGA YOSHIAKI;NAKAJIMA KOJI;MURAKAMI TAKASHI
分类号 H05H1/24;B01J19/08;C23C16/505;C23C16/54;H01L21/205 主分类号 H05H1/24
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