发明名称 Wafer pedestal cover
摘要 A pedestal cover for a semiconductor wafer. The wafer is positioned overlying the pedestal cover in a material deposition chamber, with the cover defining a peripheral circumferential trench therein. During the material deposition process, deposited material is formed within the trench and the build up of material adjacent a peripheral edge of the wafer is thereby avoided.
申请公布号 US2004226516(A1) 申请公布日期 2004.11.18
申请号 US20030675568 申请日期 2003.09.30
申请人 DANIEL TIMOTHY J.;BUCKFELLER JOSEPH W.;CLABOUGH CRAIG G.;COLLIER DONALD W. 发明人 DANIEL TIMOTHY J.;BUCKFELLER JOSEPH W.;CLABOUGH CRAIG G.;COLLIER DONALD W.
分类号 H01L21/203;C23C14/50;H01L21/00;H01L21/285;H01L21/683;H01L21/687;(IPC1-7):C23C16/00 主分类号 H01L21/203
代理机构 代理人
主权项
地址