发明名称 |
Wafer pedestal cover |
摘要 |
A pedestal cover for a semiconductor wafer. The wafer is positioned overlying the pedestal cover in a material deposition chamber, with the cover defining a peripheral circumferential trench therein. During the material deposition process, deposited material is formed within the trench and the build up of material adjacent a peripheral edge of the wafer is thereby avoided.
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申请公布号 |
US2004226516(A1) |
申请公布日期 |
2004.11.18 |
申请号 |
US20030675568 |
申请日期 |
2003.09.30 |
申请人 |
DANIEL TIMOTHY J.;BUCKFELLER JOSEPH W.;CLABOUGH CRAIG G.;COLLIER DONALD W. |
发明人 |
DANIEL TIMOTHY J.;BUCKFELLER JOSEPH W.;CLABOUGH CRAIG G.;COLLIER DONALD W. |
分类号 |
H01L21/203;C23C14/50;H01L21/00;H01L21/285;H01L21/683;H01L21/687;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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